01053nam a2200193 4500 OSt 20251106125201.0 251106b |||||||| |||| 00| 0 eng d 9783642845130 kul 621.3815 KON/F Konuma, Mitsuharu 4303 Film Deposition by Plasma Techniques/ Mitsuharu Konuma New York: Springer- Verlag, 1992 ix, 224p.: Springer Series on Atoms and Plasmas 4304 The Plasma State Mitsuharu Konuma Pages 1-10 Reactions in Plasmas Mitsuharu Konuma Pages 11-48 Generation of Cold Plasma Mitsuharu Konuma Pages 49-73 Plasma Diagnostics Mitsuharu Konuma Pages 74-106 Cold Plasma and Thin Film Formation Mitsuharu Konuma Pages 107-125 Physical Vapor Deposition Under Plasma Conditions Mitsuharu Konuma Pages 126-148 Chemical Vapor Deposition Under Plasma Conditions Mitsuharu Konuma Pages 149-184 Surface Modification by Cold Plasma Mitsuharu Konuma Pages 185-194 Back Matter Pages 195-224 4305 ddc BK 752975 752975 0 0 ddc 0 0 DOP DOP NEW 2025-11-06 0 621.3815 KON/F DOP3759 2025-11-06 07:23:00 2025-11-06 BK