| 000 | 00435nam a2200181 4500 | ||
|---|---|---|---|
| 020 |
_a _c450 |
||
| 082 | _a621.381531 TAN-P | ||
| 100 | _aTandon, U S; Khokle, W S | ||
| 245 | _aPatterning of material layers in submicron region | ||
| 250 | _a | ||
| 260 |
_aWiley Eastern Limited, New Delhi _c1993 |
||
| 300 | _a183 | ||
| 490 | _a | ||
| 500 | _a | ||
| 590 |
_aVMV _b _c450 |
||
| 650 | _aLithography, Electron beam | ||
| 942 | _cBK | ||
| 999 |
_c480012 _d480012 |
||